ION-BEAM BOMBARDMENT EFFECTS DURING FILM DEPOSITION

被引：86

作者：

ROSSNAGEL, SM

CUOMO, JJ

机构：

[1] IBM, T. J. Watson Research Cent,, Yorktown Heights, NY, USA, IBM, T. J. Watson Research Cent, Yorktown Heights, NY, USA

来源：

VACUUM | 1988年 / 38卷 / 02期

关键词：

D O I：

10.1016/0042-207X(88)90600-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：73 / 81

页数：9

共 62 条

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