GROWTH OF AGGASE2 FOR INFRARED APPLICATIONS

被引:41
作者
ROUTE, RK [1 ]
FEIGELSON, RS [1 ]
RAYMAKERS, RJ [1 ]
机构
[1] STANFORD UNIV, CTR MAT RES, STANFORD, CA 94305 USA
关键词
D O I
10.1016/0022-0248(74)90343-1
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
引用
收藏
页码:390 / 395
页数:6
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