SOLUBILITY LIMIT OF IMPURITIES IN SILICON AFTER LASER-INDUCED MELTING

被引:25
作者
STUCK, R
FOGARASSY, E
GROB, JJ
SIFFERT, P
机构
来源
APPLIED PHYSICS | 1980年 / 23卷 / 01期
关键词
D O I
10.1007/BF00899564
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:15 / 19
页数:5
相关论文
共 23 条
[1]   MELTING MODEL FOR PULSING-LASER ANNEALING OF IMPLANTED SEMICONDUCTORS [J].
BAERI, P ;
CAMPISANO, SU ;
FOTI, G ;
RIMINI, E .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (02) :788-797
[2]  
BAERI P, 1979, NOV MAT RES SOC S LA
[3]  
BEAN JC, 1978, LASER SOLID INTERACT, P487
[4]  
BENNINGHOVEN A, 1979, SECONDARY ION MASS S
[5]  
Chu W.K., 1978, BACKSCATTERING SPECT, V1st ed., DOI 10.1016/B978-0-12-173850-1.50008-9
[6]  
CULLIS AG, 1980, J APPL PHYS LETT, V34, P320
[7]  
CULLIS AG, 1978, LASER SOLID INTERACT, P311
[9]  
FOGARASSY E, 1979, NOV MAT RES SOC S LA
[10]   SOLUTE-DRAG TREATMENT OF TRANSITION FROM DIFFUSION-CONTROLLED TO DIFFUSIONLESS SOLIDIFICATION [J].
HILLERT, M ;
SUNDMAN, B .
ACTA METALLURGICA, 1977, 25 (01) :11-18