BEAM PROFILE REFLECTOMETRY - A NEW TECHNIQUE FOR DIELECTRIC FILM MEASUREMENTS

被引：51

作者：

ROSENCWAIG, A

OPSAL, J

WILLENBORG, DL

KELSO, SM

FANTON, JT

机构：

[1] Therma-Wave Inc., Fremont

来源：

APPLIED PHYSICS LETTERS | 1992年 / 60卷 / 11期

关键词：

D O I：

10.1063/1.107323

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We describe a new technique for measuring the thickness and optical constants of dielectric, semiconducting, and thin metal films. Beam profile reflectometry provides excellent precision for films as thin as 30 angstrom and as thick as 20 000 angstrom. The technique is also capable of simultaneous 2 and 3 parameter measurements and it performs all measurements with a submicron spot size.

引用

页码：1301 / 1303

页数：3

共 7 条

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[2]

BORN M, 1965, PRINCIPLES OPTICS, P38

[3]

Heavens O.S, 1991, OPTICAL PROPERTIES T

[4] SIMULTANEOUS MEASUREMENT OF REFRACTIVE-INDEX AND THICKNESS OF THIN-FILM BY POLARIZED REFLECTANCES [J].