The present study was done on the Ti concentrated surface of the Nb film which was formed by the rapid diffusion of the substrate element Ti through the Nb film. It was observed that (D the surface concentration of Ti saturated, (2) the depth profile of the Ti concentration did not change in spite of the increase of the heating time, (3) the saturation concentration was constant between 770 and 880 K, (4) The Ti concentrated layers were quickly reformed by re-heating after they are sputtered away. These experimental results show that the Ti concentrated surface has a stable structure. From the results of angle-resolved XPS, it was suggested that the concentration of Ti decreased from the surface to the inside of the Nb film (up to 5 nm), and that the multi-layered segregation seemed to occur. By the statistical thermodynamics, the multi-layered segragation can be explained with the assumption of the different atomic interactions between the layers.