Removal of particulate contaminants using ultrasonics and megasonics: A review

被引：56

作者：

Gale, GW ^{[1
]}

Busnaina, AA ^{[1
]}

机构：

[1] CLARKSON UNIV,MICROCONTAMINAT RES LAB,POTSDAM,NY 13699

来源：

PARTICULATE SCIENCE AND TECHNOLOGY | 1995年 / 13卷 / 3-4期

关键词：

D O I：

10.1080/02726359508906678

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

Sonic cleaning is a commonly used technique for removal of particles from surfaces. The theory of particle removal using ultrasound is reviewed. Effects of cavitation and acoustic streaming are discussed. Experimental results using ultrasonics and megasonics (ultrasonic cleaning near 1 MHz) from the literature are reviewed. Emphasis is placed on removal of fine particles from silicon surfaces for semiconductor manufacturing applications.

引用

页码：197 / 211

页数：15

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