ELECTRON- AND X-RAY-DIFFRACTION STUDY OF CESIUM ANTIMONIDE FILMS DEPOSITED ON MNO AND OTHER SUBSTRATES

被引:6
作者
MCCARROLL, WH
机构
[1] Electronic Components and Devices, Radio Corporation of America, Princeton, NJ
关键词
D O I
10.1063/1.1656790
中图分类号
O59 [应用物理学];
学科分类号
摘要
Electron-diffraction data obtained from cesium antimonide cathodes deposited on oxidized manganese are consistent with a composite layer structure of Cs3Sb and MnO in which no appreciable chemical reaction occurs. In constrast, the low sensitivity cathodes obtained on unoxidized manganese can be attributed to the formation of MnSb when antimony is deposited. No change in the diffraction pattern of Cs3Sb is observed when the cathode is superficially oxidized as would be expected if only surface oxidation takes place. Direct evidence was also obtained for essentially complete order in annealed samples of Cs3Sb by x-ray diffraction. Although diffraction lines, indicative of order, were observed in the electron diffraction patterns of some simple Cs3Sb cathodes, their presence could not be correlated with any changes in photoelectric sensitivity. © 1968 The American Institute of Physics.
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页码:3414 / +
页数:1
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