DAMAGE STRUCTURE OBTAINED BY CROSS-SECTIONAL OBSERVATION IN SILICON-CARBIDE IRRADIATED WITH HELIUM-IONS

被引:9
作者
NAKATA, K [1 ]
KASAHARA, S [1 ]
SHIMANUKI, S [1 ]
KATANO, Y [1 ]
OHNO, H [1 ]
KUNIYA, J [1 ]
机构
[1] JAPAN ATOM ENERGY RES INST,DEPT FUELS & MAT RES,TOKAI,IBARAKI 31911,JAPAN
关键词
D O I
10.1016/0022-3115(91)90110-S
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The microstructural change due to He-ion irradiation has been studied by cross-sectional transmission electron microscope observation in hot-pressed SiC irradiated to 1 x 10(20) ions/m2 at 300 and 1023 K. Dot and loop-shaped defect clusters are formed between 0.74 and 1.20-mu-m in depth from the ion-bombarded surface, and the damage peak depth is 1.15-mu-m in the 1023 K irradiation. He bubbles, which are formed between 0.94 and 1.16-mu-m in depth, are aligned on the c-planes and along radiation-induced dislocations. In the 300 K irradiation, the amorphous zone is formed slightly behind the damage peak depth.
引用
收藏
页码:403 / 406
页数:4
相关论文
共 17 条
[1]  
ARUGA T, 1984, JAERIM83226, P1
[2]  
Clinard F., 1986, PHYSICS RAD EFFECTS, V13, P387
[3]  
CLINARD FW, 1983, RES MECH, V8, P207
[4]   MECHANICAL, THERMAL, AND MICROSTRUCTURAL PROPERTIES OF NEUTRON-IRRADIATED SIC [J].
CORELLI, JC ;
HOOLE, J ;
LAZZARO, J ;
LEE, CW .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1983, 66 (07) :529-537
[5]   BUBBLES IN SIC CRYSTALS FORMED BY HELIUM ION IRRADIATION AT HIGH-TEMPERATURES [J].
HOJOU, K ;
IZUI, K .
JOURNAL OF NUCLEAR MATERIALS, 1988, 160 (2-3) :147-152
[6]   INSITU OBSERVATION SYSTEM OF THE DYNAMIC PROCESS OF STRUCTURAL-CHANGES DURING ION IRRADIATION AND ITS APPLICATION TO SIC AND TIC CRYSTALS [J].
HOJOU, K ;
FURUNO, S ;
OTSU, H ;
IZUI, K ;
TSUKAMOTO, T .
JOURNAL OF NUCLEAR MATERIALS, 1988, 155 :298-302
[7]  
HOPKINS GR, 1985, NUCL ENG DES FUSION, V2, P111, DOI 10.1016/0167-899X(85)90008-4
[8]   LOW ACTIVATION FUSION RATIONALE [J].
HOPKINS, GR ;
CHENG, ET .
NUCLEAR TECHNOLOGY-FUSION, 1983, 4 (03) :528-544
[9]  
KATANO Y, 1989, JAERIM89119 REP, P101
[10]  
KATSUTA H, 1986, P INT S FUSION REACT, P233