METALORGANIC CHEMICAL-VAPOR-DEPOSITION OF MANGANESE ARSENIDE FOR THIN-FILM MAGNETIC APPLICATIONS

被引:20
作者
LANE, PA
COCKAYNE, B
WRIGHT, PJ
OLIVER, PE
TILSLEY, MEG
SMITH, NA
HARRIS, IR
机构
[1] DRA,GREAT MALVERN WR14 3PS,WORCS,ENGLAND
[2] UNIV BIRMINGHAM,SCH MET & MAT,BIRMINGHAM B15 2TT,W MIDLANDS,ENGLAND
关键词
D O I
10.1016/0022-0248(94)90062-0
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Thin films of the ferromagnetic material manganese arsenide (MnAs) have been grown for the first time by atmospheric pressure metalorganic chemical vapour deposition (MOCVD), using tricarbonylmethylcyclopentadienyl manganese (TCM) and arsine. A detailed study of the MnAs growth characteristics are presented together with the resulting magnetic and structural properties.
引用
收藏
页码:237 / 242
页数:6
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