RESONANT-TUNNELING LIFETIME COMPARISON BETWEEN DOUBLE-BARRIER AND DELTA-DOPED BARRIER STRUCTURES

被引：34

作者：

ARSENAULT, CJ ^{[1
]}

MEUNIER, M ^{[1
]}

机构：

[1] ECOLE POLYTECH,DEPT GEN PHYS,MONTREAL H3C 3A7,QUEBEC,CANADA

来源：

PHYSICAL REVIEW B | 1989年 / 39卷 / 12期

关键词：

D O I：

10.1103/PhysRevB.39.8739

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：8739 / 8742

页数：4

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