X-RAY HOLOGRAPHIC MICROSCOPY USING PHOTORESISTS

被引:91
作者
JACOBSEN, C
HOWELLS, M
KIRZ, J
ROTHMAN, S
机构
[1] UNIV CALIF BERKELEY LAWRENCE BERKELEY LAB, ADV LIGHT SOURCE ACCELERATOR & FUS RES DIV, BERKELEY, CA 94720 USA
[2] UNIV CALIF SAN FRANCISCO, SCH MED, SAN FRANCISCO, CA 94114 USA
关键词
D O I
10.1364/JOSAA.7.001847
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Gabor x-ray holograms of biological specimens and of test objects that display <56-nm resolution are presented. This spatial resolution is more than an order of magnitude smaller than what has been achieved previously in x-ray holography. The holograms were recorded on photoresist using 2.57-nm soft x rays from the X—17t undulator at the National Syncrotron Light Source at Brookhaven National Laboratory. The processed photoresists were enlarged with an electron microscope and digitized using a scanning microdensitometer; the digitized holograms were reconstructed numerically. The exposure requirements were in good agreement with simple theory. The method offers promise as a technique for soft-x-ray microscopy. © 1990 Optical Society of America.
引用
收藏
页码:1847 / 1861
页数:15
相关论文
共 75 条