A STUDY ON THE FIELD DISTRIBUTION OF THIN-FILM HEADS

被引：5

作者：

TAKANO, H ^{[1
]}

SHINADA, H ^{[1
]}

SEITOU, S ^{[1
]}

FUKUHARA, S ^{[1
]}

OHNISHI, T ^{[1
]}

OTOMO, S ^{[1
]}

TODOKORO, H ^{[1
]}

SHIIKI, K ^{[1
]}

机构：

[1] HITACHI LTD, CENT RES LAB, KOKUBUNJI, TOKYO 185, JAPAN

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1992年 / 28卷 / 02期

关键词：

D O I：

10.1109/20.123855

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The field distribution of a thin-film inductive head and its relationship to pole configurations are examined. Three components of the field distribution at high frequencies are measured using a newly developed electron beam tomography method. Focused ion beam etching is used for the processing of the pole configuration. A comparison between the measured field distribution and the results of the three-dimensional computer simulation shows that the sharp field distribution suitable for high-density recording is produced to promote magnetization at the tip region. Furthermore, the optimum design of the pole configuration clarifies the feasibility of 1-mu-m track recording.

引用

页码：1024 / 1030

页数：7

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