BAND BENDING AT SEMICONDUCTOR INTERFACES AND ITS EFFECT ON PHOTOEMISSION LINE-SHAPES

被引:17
作者
MARGARITONDO, G
GOZZO, F
COLUZZA, C
机构
[1] Institut de Physique Appliquee, Ecole Polytechnique Federale
来源
PHYSICAL REVIEW B | 1993年 / 47卷 / 15期
关键词
D O I
10.1103/PhysRevB.47.9907
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We show that, contrary to intuition and under normal experimental conditions, the band bending at a semiconductor surface or interface does not strongly increase the linewidth of photoemission core-level peaks. The increase is smaller than the magnitude of the band bending, and in most cases negligible. Non-negligible increases are found only when the linewidth is smaller than and, simultaneously, the photoelectron escape depth larger than in a typical experiment.
引用
收藏
页码:9907 / 9909
页数:3
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