MICROWAVE DIAGNOSTIC RESULTS FROM THE GASEOUS ELECTRONICS CONFERENCE RF REFERENCE CELL

被引:28
作者
OVERZET, LJ
机构
关键词
DISCHARGE; ELECTRON DENSITY; GASEOUS ELECTRONICS; GASEOUS ELECTRONICS CONFERENCE REFERENCE REACTOR; MICROWAVE DIAGNOSTICS; MICROWAVE INTERFEROMETER; PLASMA; TEMPORAL DEPENDENCE;
D O I
10.6028/jres.100.030
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Electron density measurements with even the simplest microwave interferometry techniques can range over three to four orders of magnitude, can be responsive on time scales as fast as 50 ns, and are simple to obtain and interpret. Three groups have published electron density data taken in the Gaseous Electronics Conference (GEC) reference reactor using microwave interferometry. The agreement in the data from these groups at higher pressures is excellent especially when one considers that the GEC reactors involved have some key differences. These may have been the cause of some differences between the results obtained at low pressures, although, the manner in which the measurements were interpreted may also have contributed. The electron densities compare favorably in argon, helium, and nitrogen above 33.3 Pa (250 mTorr); but, the measurements tend to diverge some at 13.3 Pa (100 mTorr) and in 133 Pa helium above approximately 200 mA. It is speculated that the latter difference occurs as the discharges change from a bulk ionization or alpha-mode to a secondary electron emission or gamma-mode, and that this transition occurs at lower voltages and currents for reactors with aluminum electrodes than it does for those with stainless steel electrodes. In addition, time resolved electron densities are presented. There is agreement between time resolved measurements in the two reactors, in particular, the electron density in helium discharges is found to rise dramatically after the rf excitation is turned off while the electron densities in argon and nitrogen glows exhibit only slight increases.
引用
收藏
页码:401 / 414
页数:14
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