METHODICAL ASPECTS OF HVEM IN INSITU EXPERIMENTS IN THE FIELD OF CONDENSED MATTER

被引：5

作者：

JOUFFREY, B

机构：

[1] Laboratoire D'optique Electronique du C.N.R.S, Toulouse

来源：

PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 1979年 / 55卷 / 02期

关键词：

D O I：

10.1002/pssa.2210550223

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The “in‐situ” techniques were essentially developed these last few years in high voltage electron microscopy. This technique is compared to more recent ones as X‐ray, synchrotron radiation (soft X‐rays) or neutron topography. The available thickness is not in favour of electron microscopy. Radiation damage can also be a problem. The resolution, and also a rapid recording, render HVEM very useful in the field of “in‐situ” experiments. Copyright © 1979 WILEY‐VCH Verlag GmbH & Co. KGaA

引用

页码：549 / 562

页数：14

共 65 条

[1]

ARDENNE MV, 1942, PHYS CHEM B, V51, P61

[2]

Authier A., 1970, Modern diffraction and imaging techniques in material science, P481

[3]

AYROLES R, 1977, J MICROSC SPECT ELEC, V2, P397

[4] DESIGN OF A NEW VACUUM DEPOSITION SPECIMEN HOLDER FOR AN ELECTRON MICROSCOPE OPERATING AT 10-8 TORR [J].

BARNA, A ;

BARNA, PB ;

POCZA, JF .

VACUUM, 1967, 17 (04) :219-&

[5] NEUTRON-DIFFRACTION TOPOGRAPHIC INVESTIGATION OF GROWTH DEFECTS IN NATURAL LEAD CARBONATE SINGLE-CRYSTALS [J].

BARUCHEL, J ;

SCHLENKER, M ;

ZARKA, A ;

PETROF, JF .

JOURNAL OF CRYSTAL GROWTH, 1978, 44 (03) :356-362

[6] MECHANICAL PROPERTIES OF THIN FILMS OF SILVER [J].

BEAMS, JW ;

WALKER, WE ;

MORTON, HS .

PHYSICAL REVIEW, 1952, 87 (03) :524-525

[7] INTERFERENCE EFFECTS IN THE ELECTRON MICROSCOPY OF THIN CRYSTAL FOILS [J].

BOLLMANN, W .

PHYSICAL REVIEW, 1956, 103 (05) :1588-1589

[8]

BOURRET A, 1970, THESIS U GRENOBLE

[9] STUDIES OF SUPERPLASTICITY BY HIGH-VOLTAGE ELECTRON-MICROSCOPY [J].

BRICKNELL, RH ;

EDINGTON, JW .

ACTA METALLURGICA, 1977, 25 (04) :447-458

[10]

CASTAING R, 1962, J MICROSCOPIE, V1, P201

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