ON THE STOICHIOMETRY OF HGI2

被引:38
作者
DISHON, G
SCHIEBER, M
BENDOR, L
HALITZ, L
机构
[1] HEBREW UNIV JERUSALEM,DEPT INORGAN & ANALYT CHEM,JERUSALEM 91000,ISRAEL
[2] HEBREW UNIV JERUSALEM,SCH APPL SCI & TECHNOL,JERUSALEM 91000,ISRAEL
[3] MINIST ENERGY,INST GEOL,JERUSALEM,ISRAEL
关键词
D O I
10.1016/0025-5408(81)90122-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:565 / 574
页数:10
相关论文
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