ERROR ANALYSIS FOR REFRACTIVE-INDEX PROFILE DETERMINATION FROM NEAR-FIELD MEASUREMENTS

被引：30

作者：

HELMS, J

SCHMIDTCHEN, J

SCHUPPERT, B

PETERMANN, K

机构：

[1] Institut fur Hochfrequenztechnik, Technical University of Berlin, D-1000 Berlin 10

来源：

JOURNAL OF LIGHTWAVE TECHNOLOGY | 1990年 / 8卷 / 05期

关键词：

D O I：

10.1109/50.54467

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Refractive-index profiles of diflused optical waveguides can be determined by analyzing the near-field pattern of the waveguide. For this method, a computer simulation of measurement errors due to noise, quantization, defocusing, and nonlinearity of the camera system is presented by using data of a typical camera measurement system. The simulation procedure includes signal processing of the measured intensity profile by means of a cubic spline approximation in order to reduce the influence of the measurement system errors. The residual errors associated with this technique are on the order of a few percent when measuring typical Ti : LiNbO3 waveguides. © 1990 IEEE

引用

页码：625 / 633

页数：9

共 11 条

[1] CHARACTERIZATION OF SINGLE-MODE FIBERS BY NEAR-FIELD MEASUREMENT [J].