AN AMORPHOUS-SILICON FILM USABLE AT HIGH-TEMPERATURE - ANNEALING PROPERTIES OF A NEW FLUORINATED AMORPHOUS-SILICON

被引：7

作者：

MATSUMURA, H

NAKAGOME, Y

FURUKAWA, S

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1980年 / 19卷

关键词：

D O I：

10.7567/JJAPS.19S2.111

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：111 / 114

页数：4

相关论文

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[1] MATSUMURA H, 1980, APPL PHYS LETT, V36, P440
[2] KINETICS OF DECOMPOSITION OF AMORPHOUS HYDROGENATED SILICON FILMS
MCMILLAN, JA
PETERSON, EM
[J]. JOURNAL OF APPLIED PHYSICS, 1979, 50 (08) : 5238 - 5241
[3] MOORE JW, PHYSICAL CHEM, P57
[4] MULLER H, 1971, 2 INT C ION IMPL SEM, P85
[5] A COMPARISON OF THE THERMAL STABILITIES OF FLUORINATED AND HYDROGENATED AMORPHOUS-SILICONS
NAKAGOME, Y
MATSUMURA, H
FURUKAWA, S
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (02) : L87 - L89
[6] NEW AMORPHOUS SILICON-BASED ALLOY FOR ELECTRONIC APPLICATIONS
OVSHINSKY, SR
MADAN, A
[J]. NATURE, 1978, 276 (5687) : 482 - 484