LOW-TEMPERATURE ELECTRON-DIFFUSION MAGNETOTHERMOPOWER OF ALUMINUM .2. THEORY

被引：9

作者：

OPSAL, JL

WAGNER, DK

机构：

[1] MICHIGAN STATE UNIV,DEPT PHYS,E LANSING,MI 48824

[2] CORNELL UNIV,LAB ATOM & SOLID STATE PHYS,ITHACA,NY

来源：

JOURNAL OF PHYSICS F-METAL PHYSICS | 1976年 / 6卷 / 12期

关键词：

D O I：

10.1088/0305-4608/6/12/018

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2323 / 2332

页数：10

共 14 条

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[3] LOW-TEMPERATURE MAGNETOTHERMOELECTRIC POWER OF ALUMINUM [J].

AVERBACK, RS ;

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[4]

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[5] MAGNETOCONDUCTIVITY OF INDIUM [J].

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DATARS, WR .

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HARRISON WA, 1966, PSEUDOPOTENTIALS THE

[7] LOW-FIELD DE HAAS-VAN ALPHEN STUDY OF FERMI SURFACE OF ALUMINUM [J].

LARSON, CO ;

GORDON, WL .

PHYSICAL REVIEW, 1967, 156 (03) :703-&

[8]

LIFSHITZ IM, 1957, SOV PHYS JETP-USSR, V4, P41

[9] ELECTRON-PHONON MASS ENHANCEMENT IN THERMOELECTRICITY [J].

OPSAL, JL ;

THALER, BJ ;

BASS, J .

PHYSICAL REVIEW LETTERS, 1976, 36 (20) :1211-1214

[10] ANISOTROPIC RELAXATION-TIMES FOR IMPURITY SCATTERING ON FERMI-SURFACE [J].

SORBELLO, RS .

JOURNAL OF PHYSICS F-METAL PHYSICS, 1974, 4 (10) :1665-1683

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