THE ADVANCED LIGHT-SOURCE U8 BEAM LINE, 20-300 EV

被引:20
作者
HEIMANN, P
WARWICK, T
HOWELLS, M
MCKINNEY, W
DIGENNARO, D
GEE, B
YEE, D
KINCAID, B
机构
[1] Advanced Light Source, Lawrence Berkeley Laboratory, Berkeley
关键词
D O I
10.1016/0168-9002(92)90539-G
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The U8 is a beam line under construction at the Advanced Light Source (ALS). The beam line will be described along with calculations of its performance and its current status. An 8 cm period undulator is followed by two spherical collecting mirrors, an entrance slit, spherical gratings having a 15-degrees deviation angle, a moveable exit slit, and refocusing and branching mirrors. Internal water cooling is provided to the metal MI and M2 mirrors as well as to the gratings. Calculations have been made of both the flux output and the resolution over its photon energy range of 20-300 eV. The design goal was to achieve high intensity, 10(12) photons/s, at a high resolving power of 10 000. The U8 participating research team (PRT) is planning experiments involving the photoelectron spectroscopy of gaseous atoms and molecules, the spectroscopy of ions and actinide spectroscopy.
引用
收藏
页码:106 / 109
页数:4
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