INSPECTION OF INTEGRATED CIRCUIT PHOTOMASKS WITH INTENSITY SPATIAL FILTERS

被引：35

作者：

WATKINS, LS

机构：

[1] Western Electric Company Inc., Engineering Research Center, Princeton

来源：

PROCEEDINGS OF THE IEEE | 1969年 / 57卷 / 09期

关键词：

D O I：

10.1109/PROC.1969.7348

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Spatial filtering is shown to be an effective method for integrated circuit photomask inspection. Results show that errors of 0.2 mils can be detected using f/9.5 lenses and that the use of f/2.0 lenses detects errors of below 0.1 mil. Contamination missing and added features and step and repeat errors are all displayed. The method allows the observation of nonperiodic errors and can be used immediately for contamination inspection with very little increase in sensitivity. The procedure only needs alignment of the mask in rotation. and means that the mask can be totally inspected by scanning it through a laser beam. © 1969 IEEE. All rights reserved.

引用

页码：1634 / &