HOLOGRAM STORAGE IN PHOTOCHROMIC LINBO3

被引：61

作者：

STAEBLER, DL ^{[1
]}

PHILLIPS, W ^{[1
]}

机构：

[1] RCA LABS,PRINCETON,NJ 08540

来源：

关键词：

D O I：

10.1063/1.1655178

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：268 / 270

页数：3

共 14 条

[1] Amodei J. J., 1971, RCA Review, V32, P185
[2] IMPROVED ELECTROOPTIC MATERIALS AND FIXING TECHNIQUES FOR HOLOGRAPHIC RECORDING
AMODEI, JJ
STAEBLER, DL
PHILLIPS, W
[J]. APPLIED OPTICS, 1972, 11 (02): : 390 - &
[3] HOLOGRAPHIC PATTERN FIXING IN ELECTRO-OPTIC CRYSTALS
AMODEI, JJ
STAEBLER, DL
[J]. APPLIED PHYSICS LETTERS, 1971, 18 (12) : 540 - &
[4] AMODEI JJ, 1971, IEEE J QUANTUM ELECT, VQE 7, P63
[5] HOLOGRAPHIC STORAGE IN LITHIUM NIOBATE
CHEN, FS
LAMACCHIA, JT
FRASER, DB
[J]. APPLIED PHYSICS LETTERS, 1968, 13 (07) : 223 - +
[6] GLASS AM, 1972, P ASTMNBS S DAMAGE L
[7] GLASS AM, 1972, 372 NBS SPEC PUBL
[8] PENNINGTON KS, 1971, HDB LASERS
[9] CONTROL OF LASER DAMAGE IN LINBO3
PETERSON, GE
GLASS, AM
CARNEVALE, A
BRIDENBAUGH, PM
[J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1973, 56 (05) : 278 - 282
[10] CONTROL OF SUSCEPTIBILITY OF LITHIUM NIOBATE TO LASER-INDUCED REFRACTIVE INDEX CHANGES
PETERSON, GE
GLASS, AM
NEGRAN, TJ
[J]. APPLIED PHYSICS LETTERS, 1971, 19 (05) : 130 - &