DOPED SIO2 DEPOSITION FROM TMP IN APCVD

被引：4

作者：

BARTHOLOMEW, LD

GRALENSKI, NM

SISSON, JC

PIGNATEL, GU

机构：

[1] Watkins-Johnson Co., Scotts Valley, California

[2] Dip. di Elettrotecnica ed Elettronica, Universita di Bari, Bari, 200 - 70125, Via Re David

来源：

EUROPEAN TRANSACTIONS ON TELECOMMUNICATIONS | 1990年 / 1卷 / 02期

关键词：

D O I：

10.1002/ett.4460010215

中图分类号：

TN [电子技术、通信技术];

学科分类号：

0809 ;

摘要：

In this work we have investigated the feasibility of atmospheric pressure chemical vapor deposition of phosphorus and boron doped silicon oxides from a liquid source—namely TMP (tri‐methyl‐phosphite)—an alternative to phosphine as a P dopant source'. The most important results on process characterization, dopant incorporation, and film properties are presented. In addition to the easy operation of the liquid source, a remarkable improvement in step coverage has been found, in comparison with PSG deposition from conventional silane and phosphine chemistry. Copyright © 1990 John Wiley & Sons, Ltd.

引用

页码：167 / 172

页数：6

共 10 条

[1]

Levy R.A., Gallagher P.K., Schrey F., A new LPCFD technique oj prodiicrng borophosphosilicure glass films by injection of miscible liqctid precursors, J. Electrochem. Sot., 134, (1987)

[2]

Levy R.A., Gallagher P.K., Schrey F., Low pressure chenrical vapor deposition of borophosphosilicate gloss filmis prodirced by injection of miscible DADBS‐TMB‐TMP liquid sources, J. Elrcrrochem. Sot., 134, (1987)

[3]

Brcker F.S., Pablik D., Schafer H., Staudigl G., Process and film characrerizations of low pressure Tetuethylorthosilicate‐borophosphosilicate glass, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 4 B, 3, (1986)

[4]

Gralenski N.M., (1987)

[5]

Kern W., Kurylo W.A., Tino C.J., Optimizea chemical vapor deposition of borophosphosilicate glass films, RCA Review, 46, pp. 117-152, (1985)

[6]

Kern W., Schnable G.L., Fisher A.W., CVD glass films for passivation of silicon devices: preparotion. composition, and stress properties, RCA Review, 37, (1976)

[7]

Winkle L.W., Nelson C.W., (1981)

[8]

Ablow C.M.

[9]

Hurley K.H., Bartholomew L.D., Bordonaro D.T., BPSG films deposited by APCVD, (1987)

[10]

Shintani A., Sugaki S., Nakashina H., Temperature dependence of stresses in chemical vapor deposited vitreous films, J. Appl. Phys., 51, 8, (1980)

← 1 →