RESIDUAL RESISTIVITY DIPOLES, ELECTROMIGRATION, AND ELECTRONIC CONDUCTION IN METALLIC MICROSTRUCTURES

被引：33

作者：

SORBELLO, RS

CHU, CS

机构：

来源：

IBM JOURNAL OF RESEARCH AND DEVELOPMENT | 1988年 / 32卷 / 01期

关键词：

D O I：

10.1147/rd.321.0058

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

引用

页码：58 / 62

页数：5

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