Magnetic analysis of nickel films deposited by evaporation

被引:5
作者
Otis, HN [1 ]
机构
[1] Yale Univ, Sloane Phys Lab, New Haven, CT USA
来源
PHYSICAL REVIEW | 1933年 / 44卷 / 10期
关键词
D O I
10.1103/PhysRev.44.843
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
引用
收藏
页码:0843 / 0849
页数:7
相关论文
共 18 条
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