ASYMMETRIC VERSUS SYMMETRIC DIMERIZATION ON THE SI(001) AND AS/SI(001)2X1 RECONSTRUCTED SURFACES AS OBSERVED BY GRAZING-INCIDENCE X-RAY-DIFFRACTION

The atomic structures of the clean Si(001) and As/Si(001)2 × 1, 1 × 2 reconstructed surfaces prepared in situ have been obtained by grazing incidence X-ray diffraction under ultra high vacuum. In the former case an asymmetric dimer inclined by 7.4° on the surface plane with a slightly contracted dimer bond length (-1.5% compared to the bulk value) has been indentified as the structural basis, whereas a symmetric dimer is found after adsorption of one monolayer of As at 350 ° C. The induced displacements in the first subsurface silicon layer have been derived in both cases. These results are compatible with the models proposed on the basis of spectroscopic and direct imaging methods. © 1990.