ATOMIC CHLORINE CONCENTRATION MEASUREMENTS IN A PLASMA-ETCHING REACTOR .2. A SIMPLE PREDICTIVE MODEL

被引：38

作者：

RICHARDS, AD

SAWIN, HH

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 03期

关键词：

D O I：

10.1063/1.339735

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：799 / 807

页数：9

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