THERMAL GAS EFFUSION FROM HYDROGENATED AMORPHOUS-CARBON FILMS

被引：159

作者：

WILD, C

KOIDL, P

机构：

来源：

APPLIED PHYSICS LETTERS | 1987年 / 51卷 / 19期

关键词：

D O I：

10.1063/1.98617

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1506 / 1508

页数：3

共 7 条

[1]

Angus J.C., 1986, PLASMA DEPOSITED THI, P89

[2] COMPARATIVE-STUDY OF HYDROGEN EVOLUTION FROM AMORPHOUS HYDROGENATED SILICON FILMS [J].

BEYER, W ;

WAGNER, H ;

CHEVALLIER, J ;

REICHELT, K .

THIN SOLID FILMS, 1982, 90 (02) :145-152

[3] THE ROLE OF HYDROGEN IN A-SI-H - RESULTS OF EVOLUTION AND ANNEALING STUDIES [J].

BEYER, W ;

WAGNER, H .

JOURNAL OF NON-CRYSTALLINE SOLIDS, 1983, 59-6 (DEC) :161-168

[4] RF-PLASMA DEPOSITED AMORPHOUS HYDROGENATED HARD CARBON THIN-FILMS - PREPARATION, PROPERTIES, AND APPLICATIONS [J].

BUBENZER, A ;

DISCHLER, B ;

BRANDT, G ;

KOIDL, P .

JOURNAL OF APPLIED PHYSICS, 1983, 54 (08) :4590-4595

[5] MICROMECHANICAL INVESTIGATIONS OF AMORPHOUS HYDROGENATED CARBON-FILMS ON SILICON [J].

PETHICA, JB ;

KOIDL, P ;

GOBRECHT, J ;

SCHULER, C .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (06) :2391-2393

[6] PROCESS MONITORING OF A-C-H PLASMA DEPOSITION [J].

WILD, C ;

WAGNER, J ;

KOIDL, P .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04) :2227-2230

[7]

WILD C, 1986, THESIS U FREIBURG

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