POLYMERIC ELECTRON BEAM RESISTS

被引:95
作者
KU, HY
SCALA, LC
机构
[1] Westinghouse Research Laboratories, Pittsburgh, Pennsylvania
[2] IBM, Thomas J. Watson Research Center, Yorktown Heights, New York
关键词
D O I
10.1149/1.2412194
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Crosslinking polymers may be used as negative acting resists. The product of the minimum charge dose Q required and the weight average molecular weight Mw is a constant and is a characteristic of the polymer. At an electron beam voltage of 10 kV, this Q-M product is found experimentally to be 6.3 coul-g/cm2-mole for polystyrene, 1 coul-g/cm2-mole for poly (vinyl chloride), and 14 coul-g/cm2-mole for Polyacrylamide. Degrading polymers may be used as positive acting resists. Their average molecular weights have only a very minor effect on their efficiency as positive resists. Their glass transition temperatures Tg are an important factor. It is recommended that these resists be prebaked at T > Tg, stored and developed at T < Tg, and postbaked at T > Tg. © 1969, The Electrochemical Society, Inc. All rights reserved.
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页码:980 / &
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