FACTORS CONTRIBUTING TO THE SI L23VV, SI L1L23V, AND O KVV AUGER LINESHAPE IN SIO2

被引:27
作者
RAMAKER, DE
MURDAY, JS
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 02期
关键词
D O I
10.1116/1.570022
中图分类号
O59 [应用物理学];
学科分类号
摘要
A comparison of the measured Si L//2//3VV, Si L//1L//2//3V, and O KVV Auger lineshapes in SiO//2 with calculated lineshapes has been reported previously. In this work we carefully examine several of the factors entering the calculated lineshape: the assumed atomic Auger matrix elements, possible contributions due to Auger satellites, and the effects of possible Si 3d electron contributions in the upper valence molecular orbitals. Significantly better agreement between the measured and calculated lineshapes is achieved.
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页码:510 / 513
页数:4
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