ATOMIC DISPLACEMENT DUE TO THE ELECTROSTATIC POTENTIAL-ENERGY OF VERY HIGHLY-CHARGED IONS AT SOLID-SURFACES

被引:42
作者
SCHNEIDER, D [1 ]
BRIERE, MA [1 ]
CLARK, MW [1 ]
MCDONALD, J [1 ]
BIERSACK, J [1 ]
SIEKHAUS, W [1 ]
机构
[1] HAHN MEITNER INST BERLIN GMBH,W-1000 BERLIN 39,GERMANY
关键词
D O I
10.1016/0039-6028(93)90125-4
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Unambiguous evidence of a new radiation effect is presented based upon the occurrence of single ion defects which are created through the interaction of the Coulombic potential of slow highly charged ions (e.g., Xe44+ and U70+) and the surface region of solid insulating surfaces (i.e. mica). In the cases studied, the kinetic energy of the ions is some 300 to 500 keV (approximately 2.2 keV/u), while the energy associated with the electrostatic potential of the incident ions approaches 200 keV. Defect production in mica has been investigated as a function of incident ion charge, using an atomic force microscope. The volume of ''blister-like'' defects has been found to be proportional to the incident ion charge. These cases are compared to those of slow singly charged (Xe+) and fast (MeV) Xe17+ ions. Similar defects have been found for Xe44+ ions incident on other insulators such as Lexan and silica glass.
引用
收藏
页码:403 / 408
页数:6
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