HOT-ELECTRON ATTENUATION IN AL FILMS USING MIMS TUNNEL TRIODES

被引：4

作者：

GERICKE, W ^{[1
]}

LUDWIG, W ^{[1
]}

机构：

[1] DAWB,ZENT INST ELEKTR PHYS,INST I,BERLIN,E GER.

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1973年 / 19卷 / 02期

关键词：

D O I：

10.1002/pssa.2210190223

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：583 / 590

页数：8

共 18 条

[1]

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[2]

Duke C. B., 1969, TUNNELING SOLIDS

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[6]

HUBER EE, 1968, J APPL PHYS, V39, P11

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[8] PHOTOEMISSIVE DETERMINATION OF BARRIER PROFILE IN AL-AL2O3-AL TUNNEL JUNCTIONS [J].

KORNEFFEL, B ;

LUDWIG, W .

PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 1971, 8 (01) :149-+

[9] ENERGY-MOMENTUM DISPERSION IN AL2O3 TUNNELLING STRUCTURES [J].

KORNEFFEL, B .

PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 1972, 9 (01) :201-+

[10] INTRINSIC RESISTIVITY AND ELECTRON MEAN FREE PATH IN ALUMINUM FILMS [J].

MAYADAS, AF .

JOURNAL OF APPLIED PHYSICS, 1968, 39 (09) :4241-&

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