SURFACE PLASMONS IN THIN FILMS

被引:1245
作者
ECONOMOU, EN
机构
[1] James Franck Institute, Department of Physics, University of Chicago, Chicago
来源
PHYSICAL REVIEW | 1969年 / 182卷 / 02期
关键词
D O I
10.1103/PhysRev.182.539
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The dispersion relations for surface plasma oscillations in normal metals are investigated for single- and multiple-film systems taking retardation effects into account. The simple dielectric function ε(ω)=1-ωp2ω2 is found to be adequate for the high-frequency region in which oscillations remain undamped. Two types of possible modes of oscillation are found. One type corresponds to dispersion relations which behave linearly for not-so-high frequency, with a phase velocity always smaller than the velocity of light in the dielectric, but at least ten times larger than the Fermi velocity, while the other type consists of high-frequency modes (ω∼ωp). The role of these oscillations in the problem of transition radiation is reexamined. In the case of a thin metal film, a new interpretation is proposed for the peak observed in the transition radiation spectrum. Finally, the work is extended to superconducting metals where, in the frequency range ω<2Δ (2Δ is the superconducting energy gap), we have justified the use of a dielectric function of the same functional form as given above but with ωp2 replaced by an almost frequency-independent quantity ωps2, where ωps=cλps and λps is the actual penetration depth. In this frequency range, the oscillations are essentially undamped and play an important role in the electromagnetic properties of the multiple-film systems, and particularly when the systems exhibit the ac Josephson effect. © 1969 The American Physical Society.
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页码:539 / &
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