FABRICATION OF LEAD TITANATE THIN-FILM BY LASER-ABLATION WITH ALTERNATE DEPOSITION OF LEAD-OXIDE AND TITANIUM-OXIDE PRECURSORS

Preferentially oriented PbTiO3 thin films have been deposited on Si and Pt substrates by the laser ablation method using an ArF excimer laser. First, PbO and TiO2 ceramic targets are evaporated alternately, and PbTiO3 film is prepared on a Si substrate with natural oxide in a fixed stoichiometric ratio which was achieved by controlling the number of irradiation pulses. The obtained film shows a preferred a-axis orientation. Secondly, a TiO2 buffer layer is formed on Si a substrate with natural oxide. The lead lanthanum titanate (PLT) film deposited on this buffered layer has a preferred a-axis orientation.