DIFFUSION OF SB, GA, GE, AND (AS) IN TISI2

被引：45

作者：

GAS, P ^{[1
]}

SCILLA, G ^{[1
]}

MICHEL, A ^{[1
]}

LEGOUES, FK ^{[1
]}

THOMAS, O ^{[1
]}

DHEURLE, FM ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 63卷 / 11期

关键词：

D O I：

10.1063/1.340399

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：5335 / 5345

页数：11

共 47 条

[1]

ADDA Y, 1966, DIFFUSION SOLIDES, P648

[2]

[Anonymous], 1982, J PHYS CHEM REF D S2, V11

[3]

BARRETT CS, 1952, STRUCTURE METALS, P226

[4] ATOMIC MODEL FOR GRAIN-BOUNDARY AND SURFACE DIFFUSION [J].

BENOIST, P ;

MARTIN, G .

THIN SOLID FILMS, 1975, 25 (01) :181-197

[5] THE ROLE OF SOLUTE SEGREGATION IN GRAIN-BOUNDARY DIFFUSION [J].

BERNARDINI, J ;

GAS, P ;

HONDROS, ED ;

SEAH, MP .

PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES, 1982, 379 (1776) :159-178

[6] METASTABLE PHASE FORMATION IN TITANIUM-SILICON THIN-FILMS [J].

BEYERS, R ;

SINCLAIR, R .

JOURNAL OF APPLIED PHYSICS, 1985, 57 (12) :5240-5245

[7]

d'Heurle F. M., 1986, Solid State Devices 1985. Invited Papers Presented at the 15th European Solid State Device Research Conference, P213

[8] Kinetics of formation of silicides: A review [J].

d'Heurle, F. M. ;

Gas, P. .

JOURNAL OF MATERIALS RESEARCH, 1986, 1 (01) :205-221

[9]

d'Heurle F.M., 1972, NATURE BEHAVIOR GRAI, P339

[10] FORMATION OF THIN-FILMS OF NISI - METASTABLE STRUCTURE, DIFFUSION MECHANISMS IN INTERMETALLIC COMPOUNDS [J].

DHEURLE, F ;

PETERSSON, CS ;

BAGLIN, JEE ;

LAPLACA, SJ ;

WONG, CY .

JOURNAL OF APPLIED PHYSICS, 1984, 55 (12) :4208-4218

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