EFFECT OF ELECTROFORMING ON THE ALTERNATING-CURRENT BEHAVIOR OF THIN AMORPHOUS INSULATING FILMS

被引：13

作者：

HOGARTH, CA

NADEEM, MY

机构：

[1] Department of Physics, Brunel University, Uxbridge

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1979年 / 56卷 / 01期

关键词：

D O I：

10.1002/pssa.2210560155

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

[No abstract available]

引用

页码：K37 / K40

页数：4

共 10 条

[1] DIELECTRIC PROPERTIES OF THIN FILMS OF ALUMINIUM OXIDE AND SILICON OXIDE
ARGALL, F
JONSCHER, AK
[J]. THIN SOLID FILMS, 1968, 2 (03) : 185 - &
[2] ELECTRICAL CONDUCTION OF ZIRCONIUM OXIDE FILMS
CHAN, WS
LOH, CK
[J]. THIN SOLID FILMS, 1970, 6 (02) : 91 - &
[3] Davis E. A., 1970, Journal of Non-Crystalline Solids, V2, P406, DOI 10.1016/0022-3093(70)90157-2
[4] Dearnaley G., 1970, Journal of Non-Crystalline Solids, V4, P593, DOI 10.1016/0022-3093(70)90097-9
[5] AC CONDUCTION IN AMORPHOUS FILMS
HARROP, PJ
WOOD, GC
PEARSON, C
[J]. THIN SOLID FILMS, 1968, 2 (5-6) : 457 - +
[6] HILL AE, 1970, THIN SOLID FILMS, V5, P290
[7] HOGARTH CA, 1968, P INT C PHYS SEMICON, P1274
[8] LOW-FREQUENCY CONDUCTIVITY DUE TO HOPPING PROCESSES IN SILICON
POLLAK, M
GEBALLE, TH
[J]. PHYSICAL REVIEW, 1961, 122 (06): : 1742 - &
[9] TEMPERATURE DEPENDENCE OF AC HOPPING CONDUCTIVITY
POLLAK, M
[J]. PHYSICAL REVIEW, 1965, 138 (6A): : 1822 - &
[10] DIFFUSION OF BARIUM IN BARIUM OXIDE
REDINGTON, RW
[J]. PHYSICAL REVIEW, 1952, 87 (06): : 1066 - 1073