INFLUENCE OF OXYGEN IN THE FORMATION OF ISOELECTRONIC COMPLEXES IN IMPLANTED SI-IN

被引:5
作者
BROWN, TG
BRADFIELD, PL
机构
来源
PHYSICAL REVIEW B | 1988年 / 37卷 / 05期
关键词
D O I
10.1103/PhysRevB.37.2699
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
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页码:2699 / 2700
页数:2
相关论文
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