CRACK-PROPAGATION IN A DYNAMIC FUSE MODEL OF ELECTROMIGRATION

被引：8

作者：

BRADLEY, RM

WU, K

机构：

[1] Dept. of Phys., Colorado State Univ., Fort Collins, CO

来源：

JOURNAL OF PHYSICS A-MATHEMATICAL AND GENERAL | 1994年 / 27卷 / 02期

关键词：

D O I：

10.1088/0305-4470/27/2/017

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

We introduce a dynamic fuse model for the damage done to a metal thin film by electromigration, and study the growth of a single crack that is perpendicular to the direction of the ambient current. As the crack length 2x grows large, the velocity of the crack tips upsilon scales as upsilon(x) similar to x(alpha). We argue that the value of the exponent alpha is exactly 2. This result is in excellent agreement with our numerical work.

引用

页码：327 / 333

页数：7

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