EFFECT OF OFF-TIME ON THE COMPOSITION OF PULSE-PLATED CU-NI ALLOYS

被引：53

作者：

ROY, S ^{[1
]}

LANDOLT, D ^{[1
]}

机构：

[1] ECOLE POLYTECH FED LAUSANNE,DEPT MAT,MET CHIM LAB,CH-1015 LAUSANNE,SWITZERLAND

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1995年 / 142卷 / 09期

关键词：

D O I：

10.1149/1.2048679

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The limit of applicability of a previously developed mathematical model for the prediction of pulse-plated Cu-Ni alloys in the presence of a mass-transport controlled corrosion reaction has been investigated. The growth of a Cu-rich layer on the alloy surface, which suppresses further dissolution of nickel, has been theoretically analyzed. This model is used to compute t(cr), the maximum value of off-time when nickel dissolution is governed by a mass-transfer-controlled Cu2+ deposition reaction. Experimentally, a shift in alloy composition from the corrosion model is observed at long pulse-off times. The measured values of off-time where alloy compositions deviate from corrosion behavior concurs with the theoretically computed t(cr) value.

引用

页码：3021 / 3027

页数：7

共 25 条

[1]

BRENNER A, 1963, ELECTRODEPOSITION AL, V1, P558

[2]

BROCKRIS JO, 1972, ELECTROCHIM ACTA, V17, P973

[3]

CHAISSAING E, 1986, J APPL ELECTROCHEM, V16, P591

[4]

Chapman T. W., 1967, THESIS U CALIFORNIA

[5]

EISENBERG M, 1954, J ELECTROCHEM SOC, V101, P307

[6] DUAL-BATH ELECTRODEPOSITION OF CU/NI COMPOSITIONALLY MODULATED MULTILAYERS [J].

HASEEB, ASMA ;

CELIS, JP ;

ROOS, JR .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1994, 141 (01) :230-237

[7]

LASHMORE DS, 1992, ELECTROCHEMICAL SOC, V9210, P381

[8] ANODIC-DISSOLUTION OF BINARY SINGLE-PHASE ALLOYS AT SUBCRITICAL POTENTIAL [J].

LAURENT, J ;

LANDOLT, D .

ELECTROCHIMICA ACTA, 1991, 36 (01) :49-58

[9]

LIN K, 1992, ELECTROCHEMICAL SOC, P389

[10]

MADORE C, 1993, PLAT SURF FINISH, V80, P73

← 1 2 3 →