THERMAL ELECTRON-ATTACHMENT RATE TO CCL4, CHCL3, CH2CL2, AND SF6

被引：51

作者：

AYALA, JA

WENTWORTH, WE

CHEN, ECM

机构：

[1] UNIV HOUSTON, DEPT CHEM, HOUSTON, TX 77004 USA

[2] UNIV HOUSTON CLEAR LAKE, SCH SCI & TECHNOL, HOUSTON, TX 77058 USA

来源：

JOURNAL OF PHYSICAL CHEMISTRY | 1981年 / 85卷 / 26期

关键词：

D O I：

10.1021/j150626a008

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：3989 / 3994

页数：6

共 21 条

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