ENDOR STUDIES ON HINDERED ALKYLBIPHENYL ANION RADICALS

被引：5

作者：

ISHIZU, K

NEMOTO, F

MUKAI, K

KOHNO, M

HASEGAWA, H

机构：

[1] EHIME UNIV, FAC SCI, DEP CHEM, BUNKYO CHO, MATSUYAMA 790, JAPAN

[2] JAPAN ELECTR OPTICS LAB, AKISHIMA 196, TOKYO, JAPAN

来源：

BULLETIN OF THE CHEMICAL SOCIETY OF JAPAN | 1975年 / 48卷 / 05期

关键词：

D O I：

10.1246/bcsj.48.1635

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：1635 / 1636

页数：2

共 10 条

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