OBSERVATION OF INTERMEDIATE CUCL SPECIES DURING THE ANODIC-DISSOLUTION OF CU USING ATOMIC-FORCE MICROSCOPY

被引:21
作者
JOSEFOWICZ, JY
XIE, L
FARRINGTON, GC
机构
[1] Department of Materials Science and Engineering, University of Pennsylvania, Philadelphia
[2] Hughes Research Laboratories, Malibu, CA
关键词
D O I
10.1021/j100148a025
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Electrochemical oxidation and reduction reactions of Cu were studied in chloride-containing media by observing changes to the surface morphology of graphite and Cu working electrodes using in-situ electrochemistry atomic force microscopy (ECAFM). AFM images combined with cyclic voltammograms identified three overpotential (eta) regions corresponding to the anodic dissolution of Cu in low-concentration (0.002 M HCl) chloride solutions. At low eta, ''the Tafel region'', AFM images showed the dissolution of Cu, which was accompanied by an exponential increase in current density. At higher eta, the current-limiting region, AFM images showed the growth of CuCl crystals, which was accompanied by an abrupt decrease in current density. As eta was increased in the current-limiting region, AFM images showed the simultaneous electrodissolution of both CuCl and exposed Cu, which suggested electrochemical mechanisms involving both the formation of (CuCl2)(-), which reacts to form Cu2+ and 2Cl(-), and the direct conversion reaction of Cu to CU2+.
引用
收藏
页码:11995 / 11998
页数:4
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