CRITICAL-BEHAVIOR OF THE ELECTRICAL-RESISTANCE OF VERY THIN CR FILMS

被引：28

作者：

LOURENS, JAJ

ARAJS, S

HELBIG, HF

MEHANNA, ESA

CHERIET, L

机构：

来源：

PHYSICAL REVIEW B | 1988年 / 37卷 / 10期

关键词：

D O I：

10.1103/PhysRevB.37.5423

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：5423 / 5425

页数：3

共 8 条

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