HIGH-RATE MAGNETRON SPUTTERING OF HIGH TC NB3SN FILMS

被引：50

作者：

WU, CT ^{[1
]}

KAMPWIRTH, RT ^{[1
]}

HAFSTROM, JW ^{[1
]}

机构：

[1] ARGONNE NATL LAB,ARGONNE,IL 60439

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1977年 / 14卷 / 01期

关键词：

D O I：

10.1116/1.569104

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：134 / 137

页数：4

共 26 条

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