DIP-COATING PROCESS FOR PREPARATION OF ION-SENSITIVE NASICON THIN-FILMS

被引:8
作者
FABRY, P [1 ]
HUANG, YL [1 ]
CANEIRO, A [1 ]
PATRAT, G [1 ]
机构
[1] CNRS,CRISTALLOG LAB,F-38042 GRENOBLE,FRANCE
关键词
D O I
10.1016/0925-4005(92)80074-8
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
The dip-coating process, based on sol-gel science, is proposed to deposit thin films of ion-sensitive membrane. The different steps of the process adapted for an Na super ionic conductor (NASICON) are described and physical characterizations of thin films obtained in this way are given (using grazing-incidence X-ray diffraction). The capacitance-voltage characteristics for EOS devices show the sensitivity to be a function of the Na+ concentration in aqueous solution.
引用
收藏
页码:299 / 303
页数:5
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