NIOBIUM OXIDE BARRIER TUNNEL JUNCTION

被引：115

作者：

BROOM, RF ^{[1
]}

RAIDER, SI ^{[1
]}

OOSENBRUG, A ^{[1
]}

DRAKE, RE ^{[1
]}

WALTER, W ^{[1
]}

机构：

[1] IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA

来源：

IEEE TRANSACTIONS ON ELECTRON DEVICES | 1980年 / 27卷 / 10期

关键词：

D O I：

10.1109/T-ED.1980.20137

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1998 / 2008

页数：11

共 55 条

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[10] FABRICATION AND PROPERTIES OF NIOBIUM JOSEPHSON TUNNEL-JUNCTIONS [J].

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IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1980, 24 (02) :212-222

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