The Ultimate By-Products of Stripping Photoresist in an Oxygen Plasma

被引：25

作者：

Reichelderfer, R. F. ^{[1
]}

Welty, J. M. ^{[1
]}

Battey, J. F. ^{[1
]}

机构：

[1] Int Plasma Corp, Hayward, CA 94544 USA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1977年 / 124卷 / 12期

关键词：

semiconductor processing; atomic oxidation of hydrocarbons; sequential oxidation of solid hydrocarbons;

D O I：

10.1149/1.2133197

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Evidence is presented that the final products of stripping an isoprene photoresist in an oxygen plasma are primarily oxides of carbon and water. The by-product gases are trapped in the exhaust of the reactor and weighed. The results are consistent with the conclusion that essentially all of the hydrogen in the photoresist becomes water and roughly half of the carbon becomes carbon dioxide. Presumably the other half becomes carbon monoxide which passed through the liquid nitrogen trap as a vapor.

引用

页码：1926 / 1927

页数：3

共 5 条

[1] REDUCTION OF PHOTORESIST STRIPPING RATES IN AN OXYGEN PLASMA BY BY-PRODUCT INHIBITION AND THERMAL MASS [J].