GRANULAR NIX(SIO2)100-X THIN-FILMS AS LOW-TEMPERATURE THERMOMETERS

被引：8

作者：

UNRUH, KM ^{[1
]}

PATTERSON, BM ^{[1
]}

BEAMISH, JR ^{[1
]}

MULDERS, N ^{[1
]}

SHAH, SI ^{[1
]}

机构：

[1] DUPONT CO,DEPT CENT RES & DEV,EXPTL STN,WILMINGTON,DE 19880

来源：

JOURNAL OF APPLIED PHYSICS | 1990年 / 68卷 / 06期

关键词：

D O I：

10.1063/1.346410

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A series of granular Nix (SiO2)100-x thin films have been prepared by rf sputtering with nickel concentrations between 60 and 90 at. %. The temperature dependence of the resistance is strongly composition dependent. In films with Ni concentrations below 70%, the resistance increases as the temperature decreases, but shows a crossover to a weaker temperature dependence below about 1 K. The magnetoresistance of these materials is small and negative in applied magnetic fields up to 6 T. The temperature dependence of the resistance and the small magnetoresistance indicate that films with Ni concentrations near 66% may be useful for thermometry over a wide range of temperatures.

引用

页码：3015 / 3017

页数：3

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