DEFECT FORMATION AND STRUCTURE IN FE FILMS IRRADIATED SUCCESSIVELY BY NITROGEN AND BORON IONS

In the present article, structure phase transformations in thin iron films successively irradiated by nitrogen and boron ions and then annealed in vacuum were investigated by transmission electron microscopy (TEM). As a result of the experiments, it was found that during successive implantation some types of phase composition Fe3B, Fe3B + epsilon-Fe2 + x, epsilon-Fe2 + xN or epsilon-Fe2 + xN + FeB, depending on the irradiation nitrogen and boron doses, were formed. Successive implantation leads to an increase of the temperature range of the phase existence epsilon-Fe2 + xN in comparison with single implantation by N+ ions from 450-degrees-C to 600-degrees-C. During annealing at more than 80-degrees-C boron phases FeB are transformed into Fe2B, and Fe3B phases at T > 400-degrees-C are transformed into Fe2B. The change of the relative value of electrical resistance (R/R0) of Fe films after implantation and in the process of isochronal annealing is determined by structure and phase transformations.