CRITICAL CURRENTS IN SUBMICRON YBa2Cu3O7 LINES

被引:21
作者
Assink, H. [1 ]
v.d. Harg, A. J. M. [1 ]
Schep, C. M. [1 ]
Chen, N. Y. [1 ]
v.d. Marel, D. [1 ]
Hadley, P. [1 ]
v.d. Drift, E. W. J. M.
Mooij, J. E.
机构
[1] Delft Univ Technol, Fac Appl Phys, Lorentzweg 1, NL-2628 CJ Delft, Netherlands
关键词
D O I
10.1109/77.234030
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Lines in YBa2Cu3O7 with widths down to 200 nanometers and properties comparable with the original film, have been defined using electron beam lithography and plasma etching. One predicted property of lines smaller than the magnetic penetration depth is an increase in the critical current density due to pinning of the vortices at the edge of the sample. There have been several reports of experimental observation of edge pinning in narrow YBa2Cu3O7 lines. We present systematic measurements of narrow lines that should be far into the edge pinning regime. Nevertheless no increase of critical current density is observed in the smallest lines.
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收藏
页码:2983 / 2985
页数:3
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